Kenneth J Bhang

Title: Kenneth J Bhang: Innovator in Substrate Processing Technology

Introduction

Kenneth J Bhang is a notable inventor based in Cupertino, CA (US). He has made significant contributions to the field of substrate processing technology, particularly in the efficient removal of halogen residues from etched substrates. His innovative approach has led to the development of a patented apparatus that enhances the cleaning process in semiconductor manufacturing.

Latest Patents

Kenneth J Bhang holds a patent for an "Apparatus for efficient removal of halogen residues from etched substrates." This invention provides a solution for removing volatile residues from a substrate. The apparatus includes a chamber designed to maintain a vacuum and a heat module that heats the substrate within the chamber. Key features of the apparatus include a temperature-controlled pedestal with a projection for thermal isolation, a pair of substrate holders with support flanges, and a domed window.

Career Highlights

Kenneth is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on developing technologies that improve the efficiency and effectiveness of substrate processing. With a patent portfolio that includes this innovative apparatus, Kenneth has established himself as a key player in the field.

Collaborations

Kenneth has collaborated with talented coworkers such as Matthew Fenton Davis and Travis Morey. Their combined expertise contributes to the advancement of technologies in substrate processing and semiconductor manufacturing.

Conclusion

Kenneth J Bhang's contributions to the field of substrate processing technology are noteworthy. His patented apparatus for removing halogen residues showcases his innovative spirit and commitment to improving manufacturing processes. Kenneth continues to make strides in the industry, solidifying his reputation as a leading inventor.