Sendai, Japan

Kenji Ohyama

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: The Innovative Work of Inventor Kenji Ohyama

Introduction: Kenji Ohyama, an accomplished inventor residing in Sendai, Japan, has made significant contributions to the field of materials science. Renowned for his inventive techniques, he has developed a patented method that enhances the properties of perfluoro alkoxy alkane (PFA) films, making substantial strides in the application of advanced materials.

Latest Patents: Ohyama holds one notable patent titled "Method for smoothing a perfluoro alkoxy alkane film surface." This innovative method aims to increase the smoothness of the free surface area of PFA film. The process involves sequentially exposing the material to temperatures above its melting point, melting at least the free surface area, and then lowering the temperature to solidify the melted portion. The technique also includes remelting the free surface area to achieve optimal smoothness. The PFA film can be supported on materials such as AlO, Ni, or NiF, showcasing the versatility and application of his method.

Career Highlights: Kenji Ohyama is currently affiliated with Tohoku University, a prestigious research institution known for its cutting-edge developments in various scientific fields. His work at the university not only contributes to academic excellence but also pushes the boundaries of practical applications in the industry.

Collaborations: Throughout his career, Ohyama has collaborated with esteemed colleagues, including Masamichi Iwaki and Tadahiro Ohmi. These partnerships reflect a collaborative spirit that is essential for advancing research and fostering innovation in the realm of materials science.

Conclusion: Kenji Ohyama's contributions to the field of materials science, particularly in the development of PFA film smoothing techniques, underscore his role as a leading inventor. His ongoing work at Tohoku University, coupled with significant collaborations, ensures that he remains at the forefront of innovation within his field. The impact of his patented methods can potentially unlock new possibilities in various industrial applications, highlighting the importance of inventive minds in advancing technology.

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