Funabashi, Japan

Kenji Ohtoshi


Average Co-Inventor Count = 5.5

ph-index = 2

Forward Citations = 34(Granted Patents)


Location History:

  • Funabashi, JP (1996)
  • Numazu, JP (1999)

Company Filing History:


Years Active: 1996-1999

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2 patents (USPTO):Explore Patents

Title: Kenji Ohtoshi: Innovator in Charged Beam Technology

Introduction

Kenji Ohtoshi is a notable inventor based in Funabashi, Japan. He has made significant contributions to the field of charged beam technology, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of charged beam apparatuses.

Latest Patents

Ohtoshi's latest patents include a "Charged Beam Applying Apparatus" and a "Charged Beam Apparatus Having Cleaning Function and Method of Cleaning." The first patent describes a charged beam applying apparatus that features a column with a charged beam generation section and an optical system for controlling the charged beam. This apparatus is designed to hold a specimen in place while being exposed to the charged beam. A key innovation in this patent is the use of a specific material with an atomic number equal to or less than 22, which minimizes beam control errors caused by electric charging of oxide films formed inside the column.

The second patent outlines a charged beam apparatus that includes a source tank containing a plasma source and a plasma generating apparatus. This design allows for the introduction of plasma into the column while restricting its passage to specific cleaning portions. This innovation aims to reduce the generation of oxide and fluoride films that can cause drifting, thereby enhancing the performance of the charged beam apparatus.

Career Highlights

Kenji Ohtoshi is currently employed at Kabushiki Kaisha Toshiba, where he continues to develop advanced technologies in the field of charged beams. His work has been instrumental in pushing the boundaries of what is possible in this area of research.

Collaborations

Ohtoshi has collaborated with notable colleagues such as Jun Takamatsu and Munehiro Ogasawara. Their combined expertise has contributed to the successful development of innovative technologies in charged beam applications.

Conclusion

Kenji Ohtoshi's contributions to charged beam technology through his patents and collaborations highlight his role as a significant inventor in this field. His work continues to influence advancements in technology and research.

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