Company Filing History:
Years Active: 2007-2013
Title: Kenji Maruo: Innovator in Friction Material Technology
Introduction
Kenji Maruo is a notable inventor based in Fukuroi, Shizuoka, Japan. He has made significant contributions to the field of friction materials, holding a total of four patents. His work focuses on enhancing the performance and efficiency of friction materials through innovative techniques.
Latest Patents
Maruo's latest patents include a "Porous friction material with nanoparticles of friction modifying material." This invention describes a friction material that consists of a porous base material, at least one type of resin material, and at least one type of nanoparticle-sized friction modifying particle. The resin material is uniformly distributed throughout the base material, while a non-continuous layer of nanoparticle-sized friction modifying materials forms a porous top surface on the base material. Another patent, "Porous friction material comprising nanoparticles of friction modifying material," outlines a method for creating a friction material that includes similar components, ensuring that both the resin material and the nanoparticles are evenly dispersed throughout the base material.
Career Highlights
Kenji Maruo is currently employed at BorgWarner Inc., a company known for its advanced technology in automotive components. His work at BorgWarner has allowed him to apply his innovative ideas in a practical setting, contributing to the development of high-performance friction materials.
Collaborations
Some of Maruo's notable coworkers include Robert C. Lam and Yih-Fang Chen. Their collaboration has likely fostered a creative environment that encourages the development of cutting-edge technologies in the field of friction materials.
Conclusion
Kenji Maruo's contributions to friction material technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and engineering, positioning him as a key figure in this specialized field.