Company Filing History:
Years Active: 1995-1996
Title: Kenichi Nagai: Innovator in Semiconductor Technology
Introduction
Kenichi Nagai is a notable inventor based in Moses Lake, WA (US). He has made significant contributions to the field of semiconductor technology, particularly in the production of high-purity polycrystalline silicon rods. With a total of 3 patents to his name, Nagai's work has had a profound impact on the semiconductor industry.
Latest Patents
Nagai's latest patents focus on the production of high-purity polycrystalline silicon rods for semiconductor applications. The disclosed processes and reactors are designed for rapidly producing large diameter, high-purity polycrystalline silicon rods by depositing silicon from a gas containing a silane compound. The innovative equipment includes a reactor vessel that encloses a powder catcher with a cooled surface. Additionally, a cylindrical water jacket defines multiple reaction chambers within the vessel. The silicon powder generated in this process adheres to the coolest surfaces, which are those of the powder catcher, allowing for efficient collection. Minimal powder adheres to the walls of the reaction chambers, and in some embodiments, a fan is included to enhance gas circulation.
Career Highlights
Throughout his career, Kenichi Nagai has worked with several companies, including Advanced Silicon Materials LLC and Advanced Silicon Materials, Inc. His expertise in semiconductor technology has positioned him as a key player in the industry.
Collaborations
Nagai has collaborated with notable professionals in the field, including Hiroshi Morihara and Junji Izawa. These collaborations have further enriched his contributions to semiconductor technology.
Conclusion
Kenichi Nagai's innovative work in the production of high-purity polycrystalline silicon rods has established him as a significant figure in the semiconductor industry. His patents and collaborations reflect his commitment to advancing technology in this critical field.