Tokyo, Japan

Kenichi Kagaya

This inventor holds 2 USPTO granted patents. Top assignee: Hoya Corporation. Active years: 1986-1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenichi Kagaya. Retrieved from https://idiyas.com/inventor/kenichi-kagaya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1986-1987

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2 patents (USPTO):Explore Patents

Title: Kenichi Kagaya: Innovator in Photo-Mask Technology

Introduction

Kenichi Kagaya, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of photo-mask technology. With a total of two patents to his name, Kagaya's work addresses critical elements in reducing manufacturing complexities and enhancing the performance of photo-masks used in various applications.

Latest Patents

One of Kenichi Kagaya's latest patents is focused on a photo-mask blank comprising a shading layer with a variable etch rate. This invention features a transparent substrate member with a chromium shading layer on its surface, which is designed to optimize the etching process. The shading layer includes a first portion that is etched at a higher rate compared to a second portion, utilizing nitrogen or carbon for differentiation. This innovation allows for a more efficient photo-mask production process, improving the quality and precision of lithography in semiconductor manufacturing.

Career Highlights

Currently, Kenichi Kagaya is affiliated with Hoya Corporation, a renowned global leader in optical products and imaging solutions. His expertise in photo-mask technology has been instrumental in advancing the company's capabilities in this niche field. With his innovative inventions, he continues to play a pivotal role in enhancing Hoya Corporation's product offerings and market competitiveness.

Collaborations

In his professional journey, Kenichi has worked alongside talented colleagues including Shigekazu Matsui and Masao Ushida. Their collaborative efforts have fostered a creative environment, leading to the development of groundbreaking technologies in the optics industry. This synergy has not only enriched their respective careers but also contributed significantly to the advancements in photo-mask technology.

Conclusion

Kenichi Kagaya stands out as a notable inventor in Tokyo, leveraging his expertise to revolutionize photo-mask technology. With a focus on a unique variable etch rate design, his innovations are poised to make lasting impacts in semiconductor manufacturing. As he continues his work at Hoya Corporation, the industry can anticipate further advancements from this dedicated inventor, whose contributions are key to driving the future of optical products.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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