Hitachi, Japan

Ken Murayama


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 1985

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1 patent (USPTO):Explore Patents

Title: Ken Murayama: Innovator in Pressure Sensor Technology

Introduction

Ken Murayama is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of pressure sensors. His innovative approach has led to the creation of a unique pressure sensor design that enhances performance and reliability.

Latest Patents

Ken Murayama holds a patent for a pressure sensor with an improved semiconductor diaphragm. This invention features a semiconductor diaphragm that includes both thin and thick wall parts. The design incorporates recesses formed in the lower surface of the diaphragm, which are strategically placed below the thin wall parts. Piezoresistance elements are positioned on the upper surface of the diaphragm near the thin wall parts. Additionally, a supporting member is sealingly joined to the thick wall parts at the lower surface of the diaphragm. This configuration ensures that the recesses are sealed and confined, preventing high-pressure fluid from escaping when the thin wall part is compromised. He has 1 patent to his name.

Career Highlights

Throughout his career, Ken Murayama has worked with prominent companies, including Hitachi, Ltd. and Hitachi Construction Machinery Company. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.

Collaborations

Ken has collaborated with notable coworkers such as Satoshi Shimada and Shigeyuki Kobori. Their combined expertise has fostered a creative environment that has led to advancements in semiconductor technology.

Conclusion

Ken Murayama's contributions to pressure sensor technology exemplify his innovative spirit and dedication to engineering excellence. His work continues to influence the field and inspire future advancements in semiconductor applications.

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