Company Filing History:
Years Active: 1998-2003
Title: Innovations of Kelvin F Poole
Introduction
Kelvin F Poole is a notable inventor based in Clemson, SC (US). He has made significant contributions to the field of semiconductor technology and integrated circuits. With a total of 2 patents, his work focuses on processes that enhance the reliability and efficiency of electronic devices.
Latest Patents
One of his latest patents is titled "Process for forming layers on substrates." This invention is directed towards various processes and systems for forming layers and coatings on substrates, such as semiconductor wafers and solar cells. In this process, a liquid precursor is atomized and exposed to light energy, with additional exposure to an electric field and/or sonic energy. An alternative embodiment includes a stress measurement device that monitors stress in the substrate during layer deposition, allowing for automatic control of energy emitted onto the substrate.
Another significant patent is related to "Systems, methods and computer program products for prediction of defect-related failures in integrated circuits." This invention identifies objects in a circuit layout for integrated circuit design, generating sample object defects and predicting the reliability of integrated circuits based on defect magnitudes. The models used in this patent include log-linear regression models, which relate defect magnitudes to object lifetimes.
Career Highlights
Kelvin F Poole is affiliated with Clemson University, where he contributes to research and development in semiconductor technologies. His work has implications for improving the manufacturing processes of integrated circuits, which are crucial for modern electronics.
Collaborations
Some of his notable coworkers include Mohamed S Moosa and Rajendra Singh, who collaborate with him on various research projects.
Conclusion
Kelvin F Poole's innovative patents and contributions to semiconductor technology highlight his role as a significant inventor in the field. His work continues to influence advancements in integrated circuit reliability and manufacturing processes.