Keith W Donaldson

Title: Innovations of Keith W. Donaldson

Introduction

Keith W. Donaldson is an accomplished inventor based in Buffalo Grove, IL (US). He holds a total of 5 patents that showcase his innovative contributions to various fields. His work primarily focuses on developing advanced materials and barriers that enhance protection against chemical vapors and insect infestations.

Latest Patents

Among his latest patents is the "Barrier film substrate, method of making same, and use thereof." This invention features a barrier film substrate that includes a first layer made of a polymer and a transition metal with chemical sequestering properties. This unique combination allows for a reaction to occur when exposed to chemical vapors, effectively blocking their passage. Additionally, he has developed an "Insect barrier," which is an active barrier designed to protect against termites and other insects. This invention incorporates a copper-carbon matrix into a polymeric or paper substrate, creating a protective barrier that can be used in various applications, including underlayment for structures and protective films for sensitive equipment.

Career Highlights

Throughout his career, Keith has worked with Engineered Materials, Inc., where he has made significant contributions to the field of material science. His innovative approach has led to the development of products that address critical challenges in protecting structures and equipment from environmental threats.

Collaborations

Keith has collaborated with notable professionals in his field, including John Franey and Nancy Harper. Their combined expertise has contributed to the successful development of his patented technologies.

Conclusion

Keith W. Donaldson's innovative work in developing barrier materials and insect protection solutions has made a significant impact in his field. His patents reflect a commitment to advancing technology that enhances safety and protection in various applications.