Keisuke Ishihama

Title: Keisuke Ishihama: Innovator in Dielectric Thin Film Technology

Introduction

Keisuke Ishihama is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of dielectric thin films and related technologies. His work has implications for various applications, including hard disk drives and inkjet printers.

Latest Patents

Ishihama holds a patent for a dielectric thin film that includes a metal oxide. This metal oxide comprises bismuth, sodium, barium, and titanium. Notably, at least a part of the metal oxide is a tetragonal crystal with a perovskite structure. The (100) plane of this tetragonal crystal is oriented in a normal direction of the dielectric thin film's surface. His innovations also encompass piezoelectric actuators, piezoelectric sensors, head assemblies, head stack assemblies, and printer devices.

Career Highlights

Throughout his career, Ishihama has worked with prominent organizations such as TDK Corporation and the Tokyo Institute of Technology. His experience in these institutions has allowed him to develop and refine his inventions, contributing to advancements in technology.

Collaborations

Ishihama has collaborated with talented individuals in his field, including Yusuke Sato and Mirai Ishida. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Keisuke Ishihama's work in dielectric thin film technology showcases his innovative spirit and dedication to advancing the field. His contributions have the potential to impact various industries significantly.