Keiji Yamada

Title: Keiji Yamada: Innovator in Thin Film Technology

Introduction: Keiji Yamada is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of thin film technology, holding a total of 3 patents. His innovative approaches have advanced the methods used in film formation, showcasing his expertise and dedication to the field.

Latest Patents: Yamada's latest patents include a process for making a thin film and an apparatus for the same. The film-forming apparatus he developed features a gas introduction tube for introducing an inert gas into a vacuum chamber, a vapor source, and a target. This apparatus forms a thin film by depositing sputtered particles and evaporated particles on the surface of a substrate. The sputtered particles are liberated by sputtering the target using ion energy of plasma generated around the target, while the evaporated particles are obtained by evaporating a vapor source through heating and ionizing evaporated components using the plasma. The apparatus includes a substrate holder, a rotating table, and a shield with a hollow space, all designed to optimize the film-forming process.

Career Highlights: Throughout his career, Keiji Yamada has worked with notable companies such as Sanyo Vacuum Industries Co. Ltd. His experience in these organizations has contributed to his development of advanced technologies in thin film applications.

Collaborations: Yamada has collaborated with various professionals in his field, including his coworker Akihiro Kitabatake. Their joint efforts have furthered the advancements in thin film technology.

Conclusion: Keiji Yamada's contributions to thin film technology through his patents and career achievements highlight his role as an influential inventor. His work continues to impact the industry and inspire future innovations.