Company Filing History:
3 out of 42,526 
1 out of 1 Years Active: 1986-1992
Title: Keiji Tada: Innovator in Etching and Plasma Treatment Technologies
Introduction
Keiji Tada is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the fields of etching and plasma treatment technologies. With a total of 3 patents to his name, Tada's work has advanced the precision and accuracy of these processes.
Latest Patents
Tada's latest patents include an "Apparatus for detecting an end point of etching" and a "Method of detecting an end point of plasma treatment." The first patent describes a method for detecting the end point of etching by utilizing emission spectroscopy. This method computes a correction value based on the emission intensities during and after etching, allowing for consistent detection accuracy regardless of emission quantity fluctuations. The second patent focuses on accurately detecting the end point of plasma treatment by selecting a characteristic wavelength from the plasma spectrum. This innovation helps prevent erroneous detection and ensures precise results even in short reaction times.
Career Highlights
Throughout his career, Keiji Tada has worked with prominent companies such as Hitachi, Ltd. and Hitachi Sanki Engineering Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced technologies in his field.
Collaborations
Tada has collaborated with notable colleagues, including Gen Marumoto and Takashi Fujii. These partnerships have likely enriched his work and led to further innovations in his area of expertise.
Conclusion
Keiji Tada's contributions to etching and plasma treatment technologies demonstrate his commitment to innovation and precision. His patents reflect a deep understanding of the complexities involved in these processes, making him a significant figure in the field.