Kean Chew

Title: Kean Chew: Innovator in Substrate Polishing Technology

Introduction

Kean Chew is a notable inventor based in Santa Clara, California. He has made significant contributions to the field of substrate polishing operations, particularly through his innovative patent that addresses the wear and replacement of retaining rings used in polishing apparatuses.

Latest Patents

Kean Chew holds a patent for "Determining when to replace a retaining ring used in substrate polishing operations." This invention discloses an apparatus and methods for polishing substrates. The retaining ring features an inner surface that contacts the peripheral edge of the substrate, a bottom surface that interacts with the polishing surface, and a wear marker that indicates a preselected amount of wear. This design allows for efficient monitoring and replacement of the retaining ring, ensuring optimal performance during chemical mechanical polishing operations.

Career Highlights

Kean Chew is associated with Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on enhancing the efficiency and effectiveness of substrate polishing processes, which are critical in the manufacturing of semiconductor devices.

Collaborations

Throughout his career, Kean has collaborated with talented individuals such as Hung Chih Chen and Steven M Zuniga. These collaborations have contributed to the advancement of technology in the field of substrate polishing.

Conclusion

Kean Chew's innovative work in substrate polishing technology exemplifies the importance of continuous improvement in manufacturing processes. His contributions are vital for the advancement of the semiconductor industry.