Location History:
- Osaka, JP (1990 - 1991)
- Tenri, JP (1998 - 2000)
Company Filing History:
Years Active: 1990-2000
Title: Kazuo Sugimoto: Innovator in Plasma Etching Technology
Introduction
Kazuo Sugimoto is a prominent inventor based in Tenri, Japan. He has made significant contributions to the field of semiconductor device fabrication, particularly in the area of plasma etching technology. With a total of 4 patents to his name, Sugimoto's work has advanced the understanding and efficiency of etching processes in semiconductor manufacturing.
Latest Patents
One of Sugimoto's latest patents is a dry etching method that focuses on diagnosing the function of plasma etching apparatuses. This method involves generating plasma from a gas mixture that includes halogen and oxygen under predetermined conditions. By measuring the intensity of emissions from the plasma at two different wavelengths, a ratio is obtained that helps in assessing the operational status of the etching apparatus.
Another notable patent by Sugimoto is also a dry etching method, which specifically addresses the selectivity of silicon material layers formed on an oxide underlayer. This method utilizes plasma generated from a halogen and oxygen gas mixture. The emissions from the plasma are measured, and the intensity ratio is determined to evaluate the selectivity of silicon layers to oxide underlayers. This correlation allows for the optimization of plasma conditions to achieve desired selectivity in etching processes.
Career Highlights
Kazuo Sugimoto is associated with Sharp Kabushiki Kaisha Corporation, where he has been instrumental in developing innovative technologies for semiconductor fabrication. His expertise in plasma etching has positioned him as a key figure in the advancement of manufacturing processes within the industry.
Collaborations
Sugimoto has collaborated with notable colleagues, including Kouichiro Adachi and Satoshi Morishita. Their combined efforts have contributed to the development of cutting-edge technologies in the field of semiconductor manufacturing.
Conclusion
Kazuo Sugimoto's contributions to plasma etching technology have significantly impacted the semiconductor industry. His innovative methods and collaborative efforts continue to drive advancements in the field, showcasing the importance of research and development in technology.