Location History:
- Numazu, JP (2006)
- Gotenba, JP (2009)
Company Filing History:
Years Active: 2006-2009
Title: Kazunori Bessho: Innovator in Extreme Ultraviolet Radiation Technology
Introduction
Kazunori Bessho is a prominent inventor based in Gotenba, Japan. He has made significant contributions to the field of extreme ultraviolet (EUV) radiation technology. With a total of two patents to his name, Bessho's work is pivotal in advancing lithography equipment used in semiconductor manufacturing.
Latest Patents
Bessho's latest patents include a light source device for producing extreme ultraviolet radiation and a method of generating extreme ultraviolet radiation. The first patent describes an EUV light source device that controls electrode ablation. This device gasifies a raw material through energy beam irradiation, producing high-temperature plasma. The gasified raw material is dripped near the discharge region, allowing it to reach the discharge area between the electrodes. A laser beam then irradiates the high-temperature plasma raw material, which spreads towards the discharge region. Power is applied to the discharge electrodes, heating and exciting the gasified high-temperature plasma raw material to emit EUV radiation. This radiation is collected by an EUV collector mirror and directed to lithography equipment.
The second patent focuses on increasing the efficiency of conversion into EUV radiation energy. It describes a discharge tube connected to a gas supply space for the discharge gas, which is located radially concerning the optical axis. The discharge gas is supplied to the discharge space, passes through the anode's center opening, and is evacuated from an opening. A pulse current source connects the anode and cathode, producing discharge plasma and forming EUV radiation through a heavy current pulse. The emitted EUV radiation passes through the anode's opening and is released externally.
Career Highlights
Kazunori Bessho is currently employed at Ushio Denki Kabushiki Kaisha, a company known for its innovations in lighting and imaging technologies. His work has been instrumental in developing advanced EUV sources that enhance the efficiency and output of lithography processes.
Collaborations
Bessho collaborates with notable colleagues, including Hiroto Sato and Yusuke Teramoto. Their combined expertise contributes to the ongoing advancements in EUV technology.
Conclusion
Kazunori Bessho's contributions to extreme ultraviolet radiation technology are significant and impactful. His innovative patents and collaborations continue to shape the future of semiconductor manufacturing.