Kazunobu Tanaka

Title: Kazunobu Tanaka: Innovator in Silicon Thin Film Technology

Introduction

Kazunobu Tanaka is a notable inventor based in Niihari, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon thin films. His innovative work has led to advancements in various applications, including electronics and photovoltaics.

Latest Patents

Kazunobu Tanaka holds a patent for a silicon thin film and the method of producing the same. This silicon thin film is primarily composed of silicon atoms, with a hydrogen content ranging from 0 to 8 atm %. It also includes at least one element selected from fluorine, chlorine, bromine, and iodine, along with an impurity element. The unique aspect of this thin film is that about 80 to 100% of microcrystalline grains are interspersed in an amorphous phase. The production method involves deposition on a substrate in a plasma atmosphere, utilizing silane or halogenated silane as raw material gas, combined with a dopant gas. The process includes diluting the mixed gas with hydrogen and applying electric power to achieve a specific plasma discharge power density.

Career Highlights

Kazunobu Tanaka is associated with Toa Nenryo Kogyo, K.K., where he has been instrumental in advancing research and development in silicon materials. His work has not only contributed to the company's portfolio but has also positioned him as a key figure in the field of thin film technology.

Collaborations

Throughout his career, Kazunobu has collaborated with esteemed colleagues such as Shigeru Iijima and Akihisa Matsuda. These collaborations have fostered innovation and have led to significant advancements in their respective fields.

Conclusion

Kazunobu Tanaka's contributions to silicon thin film technology exemplify the impact of innovative thinking in materials science. His patent and ongoing work continue to influence advancements in various technological applications.