Kazumichi Akashi

Title: Kazumichi Akashi: Innovator in Photoresist Technology

Introduction

Kazumichi Akashi is a notable inventor based in Kakegawa, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of chemically amplified positive type photoresist compositions. With a total of 2 patents to his name, Akashi continues to push the boundaries of innovation in this specialized area.

Latest Patents

His latest patents include a chemically amplified positive type photoresist composition and a pattern forming method using the same. The first patent addresses the need for a photoresist composition that can form patterns with excellent cross-sectional shapes. This composition includes a polymer that reacts with acid to increase its solubility in an alkaline aqueous solution, along with an organic solvent and two types of photo acid generators. The second patent focuses on a photosensitive resin composition suitable for forming thick films, which comprises an alkali-soluble resin, a plasticizer, an acid generator, and an organic solvent.

Career Highlights

Kazumichi Akashi is currently employed at Merck Patent GmbH, where he applies his expertise in photoresist technology. His work has been instrumental in advancing the capabilities of photoresist materials used in various applications, particularly in the semiconductor industry.

Collaborations

Throughout his career, Akashi has collaborated with notable colleagues, including Masato Suzuki and Shunji Kawato. These collaborations have further enriched his research and development efforts in the field.

Conclusion

Kazumichi Akashi stands out as an influential inventor in the realm of photoresist technology. His innovative patents and contributions to the industry reflect his commitment to advancing this critical area of research.