Company Filing History:
Years Active: 2014
Title: Kazumasa Ito: Innovator in Semiconductor Technology
Introduction
Kazumasa Ito is a prominent inventor based in Mie, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.
Latest Patents
Kazumasa Ito holds a patent titled "Method for fabricating semiconductor device and semiconductor device." This patent describes a method that includes forming a dielectric film above a substrate, creating an opening in the dielectric film, and applying a high melting metal film on the side wall and bottom surface of the opening. The process further involves forming a seed film of copper (Cu) on the high melting metal film, performing a nitriding process after the seed film is formed, and conducting an electroplating process to bury a Cu film in the opening while energizing the seed film.
Career Highlights
Kazumasa Ito is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work has been instrumental in advancing semiconductor fabrication techniques, which are crucial for modern electronic devices.
Collaborations
Kazumasa Ito has collaborated with notable colleagues, including Toshiyuki Morita and Akitsugu Hatazaki. Their combined expertise has contributed to the success of various projects within the semiconductor field.
Conclusion
Kazumasa Ito's innovative work in semiconductor technology exemplifies the importance of research and development in advancing electronic manufacturing processes. His contributions continue to influence the industry significantly.