Company Filing History:
Years Active: 1980-1990
Title: Kazuki Ban: Innovator in Urethane Technology
Introduction
Kazuki Ban is a notable inventor based in Nobeoka, Japan. He has made significant contributions to the field of urethane technology, holding a total of 3 patents. His work focuses on developing advanced materials that enhance the performance and durability of various products.
Latest Patents
Kazuki Ban's latest patents include a urethane prepolymer composition and a polyurethane coating composition. The urethane prepolymer composition comprises a terminal isocyanate group-containing urethane prepolymer derived from a polytetramethylene glycol and an aliphatic and/or alicyclic diisocyanate. This composition exhibits excellent compatibility with diol and polyol compounds, allowing it to be formulated into a polyurethane coating system. This system is designed to create a coating film that offers exceptional weathering resistance, elastic recovery, and transparency, along with impressive low-temperature physical properties, such as mechanical strength and flexibility at temperatures as low as -30 degrees Celsius. Additionally, he has developed a process for recovering heavy metal ions or heavy metal ions and halogen values from solutions containing lower aliphatic monocarboxylic acids.
Career Highlights
Kazuki Ban is associated with Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the chemical industry. His innovative work has contributed to the advancement of materials used in various applications, particularly in the automotive and construction sectors.
Collaborations
Throughout his career, Kazuki Ban has collaborated with esteemed colleagues, including Masatoshi Tanouchi and Hiroshi Takeuchi. These collaborations have further enriched his research and development efforts, leading to groundbreaking advancements in urethane technology.
Conclusion
Kazuki Ban's contributions to urethane technology exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of material science and its applications, making him a significant figure in his field.