Chigasaki, Japan

Kazuhiko Mitsuhashi


Average Co-Inventor Count = 6.0

ph-index = 3

Forward Citations = 35(Granted Patents)


Company Filing History:


Years Active: 1994-1998

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3 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Kazuhiko Mitsuhashi

Introduction

Kazuhiko Mitsuhashi, based in Chigasaki, Japan, is an accomplished inventor with a remarkable portfolio of three patents. His innovative contributions primarily focus on the development of advanced sputtering targets, which play a crucial role in the manufacturing of high-quality thin films used in various applications.

Latest Patents

Mitsuhashi's most recent patents detail a sophisticated sputtering target formed from a refractory metallic silicide. The composition of MSi.sub.x includes a mixture of an MSi.sub.2 phase, consisting of particles from at least one refractory metal such as tungsten, molybdenum, titanium, zirconium, hafnium, nickel, and tantalum, along with an Si phase that serves as the matrix. Notably, this invention features interface layers with a predetermined thickness at the junctions of the MSi.sub.2 and Si phases. The parameters set for the value X in the composition formula MSi.sub.x, ranging from 2.0 to 4.0, as well as the careful regulation of thickness, density ratio, electrical resistivity, and surface roughness, collectively ensure that a uniform, high-quality thin film with consistent composition distribution can be produced reliably.

Career Highlights

Kazuhiko Mitsuhashi is currently employed at Kabushiki Kaisha Toshiba, a well-regarded technology company known for its innovative contributions across various sectors. His expertise in material sciences and engineering has enabled him to push the boundaries of sputtering technology, enhancing the capabilities of thin-film manufacturing processes.

Collaborations

Throughout his career, Mitsuhashi has collaborated with talented colleagues, including Michio Satou and Takashi Yamanobe. These collaborations often enhance the depth of research and innovation within their projects, resulting in cutting-edge advancements in material technologies.

Conclusion

Kazuhiko Mitsuhashi stands as a prominent figure in the realm of materials innovation, particularly through his work on sputtering targets. With his extensive patent portfolio and collaborative spirit, he continues to contribute significantly to the industry, fostering advancements that will shape the future of thin-film applications.

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