Company Filing History:
Years Active: 1984-1987
Title: Kavilipalayam Natarajan: Innovator in Oxymethylene Polymer Technology
Introduction
Kavilipalayam Natarajan is a notable inventor based in Irvington, NJ (US). He has made significant contributions to the field of polymer technology, particularly in the development of oxymethylene polymers. With a total of 2 patents, Natarajan's work focuses on enhancing the properties and applications of these materials.
Latest Patents
Natarajan's latest patents include innovative solutions to common challenges in polymer processing. One of his patents addresses the black speck formation that occurs during the compounding and molding of admixtures of oxymethylene polymers and polyamides. This issue can be mitigated by adding the polyamide to the oxymethylene polymer as a dispersion in a carrier resin that is inert to the oxymethylene polymer. The polyamide in this dispersion comprises less than about 50 weight percent. Another patent involves isocyanate-coupled reinforced oxymethylene polymers, which provides an improved molding composition. This composition includes an oxymethylene polymer, a blocked or unblocked isocyanate compound, a filler, and an isocyanate-active catalyst. The resulting shaped articles exhibit desirable mechanical properties without the need for fibrous reinforcing agents.
Career Highlights
Kavilipalayam Natarajan is currently employed at Celanese GmbH, where he continues to innovate in the field of polymer technology. His work has been instrumental in advancing the applications of oxymethylene polymers in various industries.
Collaborations
Natarajan has collaborated with several professionals in his field, including Daniel Zimmerman and Andrew B. Auerbach. These collaborations have contributed to the successful development of his patented technologies.
Conclusion
Kavilipalayam Natarajan is a distinguished inventor whose work in oxymethylene polymer technology has led to significant advancements in the field. His innovative patents and collaborations highlight his commitment to improving polymer applications.