Company Filing History:
Years Active: 2002-2004
Title: Innovations of Katsumi Sugiura in Semiconductor Technology
Introduction
Katsumi Sugiura is a notable inventor based in Yamanashi, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches.
Latest Patents
One of his latest patents is a "Compound semiconductor device manufacturing method." This method involves depositing a film containing zinc oxide and silicon oxide on a compound semiconductor layer as a diffusion source. The process allows for the diffusion of zinc into the compound semiconductor layer through annealing, enhancing the endurance of laser end face window structures compared to prior methods. Another significant patent is for a "Semiconductor laser and method of manufacturing the same." This patent details specific growth profile angles for layers within an S-type semiconductor laser, ensuring optimal performance and structural integrity.
Career Highlights
Katsumi Sugiura is currently associated with Fujitsu Quantum Devices Limited, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices.
Collaborations
He has collaborated with notable colleagues such as Chikashi Anayama and Akira Furuya, contributing to various projects that enhance the field of semiconductor research and development.
Conclusion
Katsumi Sugiura's innovative work in semiconductor technology, particularly through his patents, reflects his commitment to advancing the industry. His contributions are vital for the future of semiconductor devices and their applications.