Ohtsu, Japan

Katsumasa Yamamoto


Average Co-Inventor Count = 3.9

ph-index = 3

Forward Citations = 50(Granted Patents)


Location History:

  • Ootsu, JP (1992)
  • Ohtsu, JP (1990 - 2002)

Company Filing History:


Years Active: 1990-2002

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5 patents (USPTO):Explore Patents

Title: Katsumasa Yamamoto: Innovator in Photosensitive Resin Technology

Introduction

Katsumasa Yamamoto is a notable inventor based in Ohtsu, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 5 patents. His innovative approaches have addressed various challenges in the handling and processing of unexposed photosensitive resin plates.

Latest Patents

One of his latest patents is a process for treating the periphery of unexposed photosensitive resin plates. This process involves the irradiation of light with a wavelength of not longer than 300 nm on the periphery of the unexposed photosensitive resin plate until it is free of stickiness. This invention effectively resolves issues such as the sticking of peripheral resin to packages, working tables, exposure tables, and vacuum adhesion sheets. It also addresses the problem of dust sticking to the periphery of unexposed plates and prevents unexposed resin from adhering to hands during handling. By eliminating these defects, his process enhances the efficiency of making printing plates.

Career Highlights

Katsumasa Yamamoto is associated with Toyo Boseki Kabushiki Kaisha, where he continues to innovate in his field. His work has been instrumental in advancing the technology surrounding photosensitive resins, making significant impacts on the industry.

Collaborations

He has collaborated with notable coworkers such as Kosaku Onodera and Takamitsu Ariki, contributing to a dynamic team focused on innovation and problem-solving in resin technology.

Conclusion

Katsumasa Yamamoto's contributions to the field of photosensitive resin technology exemplify the spirit of innovation. His patents not only address critical issues in the industry but also pave the way for future advancements.

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