Katsuhisa Ohkawa

Title: Innovations of Katsuhisa Ohkawa

Introduction

Katsuhisa Ohkawa is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology. His work focuses on improving the efficiency and accuracy of polishing processes in semiconductor manufacturing.

Latest Patents

Katsuhisa Ohkawa holds a patent for a "Polishing process monitoring method and apparatus, its endpoint detection method, and polishing machine using same." This innovative apparatus is designed to monitor the polishing process of semiconductor wafers accurately. It addresses various factors that can affect optical measurements, such as the configuration, material, and size of layered structures on the wafer. The apparatus includes a light irradiating means, first and second light receiving means, and a monitoring means that collectively enhance the precision of the polishing process.

Career Highlights

Katsuhisa Ohkawa is currently employed at NEC Corporation, where he continues to develop advanced technologies in semiconductor processing. His expertise in this area has positioned him as a key figure in the industry. He has been instrumental in driving innovations that enhance the performance and reliability of semiconductor devices.

Collaborations

Throughout his career, Katsuhisa has collaborated with esteemed colleagues such as Akira Takeishi and Hideo Mitsuhashi. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Katsuhisa Ohkawa's contributions to semiconductor technology through his innovative patent and collaborative efforts highlight his importance in the field. His work continues to influence advancements in the industry, ensuring more efficient manufacturing processes.