Katsuhiko Oya

Title: Innovations of Katsuhiko Oya in Semiconductor Manufacturing

Introduction

Katsuhiko Oya is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative methods have paved the way for advancements in this critical technology sector.

Latest Patents

Katsuhiko Oya holds 1 patent for a method of manufacturing a semiconductor device. This invention outlines a process that includes forming an insulating film and a first metal film on one major surface of a semiconductor substrate. Each of these films has a partially exposed surface. The method further involves selectively forming a second metal film on the exposed surface of the first metal film. This formation occurs in an atmosphere containing a gasified silicon compound, which is derived from a liquid silicon compound that includes elements such as carbon, hydrogen, oxygen, chlorine, and fluorine. The process also chemically modifies the exposed surface of the insulating film with the silicon compound or its reaction product.

Career Highlights

Katsuhiko Oya is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to focus on semiconductor innovations that enhance device performance and reliability.

Collaborations

Katsuhiko Oya has collaborated with notable colleagues, including Akihiro Kajita and Johta Fukuhara. These partnerships have contributed to the development of advanced technologies in semiconductor manufacturing.

Conclusion

Katsuhiko Oya's contributions to semiconductor manufacturing through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and inspire future innovations.