Jyouetsu, Japan

Katsuhiko Onishi


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Innovations by Katsuhiko Onishi: Advancements in Plasma Processing

Introduction: Katsuhiko Onishi, an accomplished inventor based in Jyouetsu, Japan, has made significant contributions to the field of plasma processing technology. With a focus on enhancing wafer processing efficiency, his innovations aim to improve the longevity of processing chambers while preventing damage and particle generation.

Latest Patents: Katsuhiko Onishi holds a notable patent for a "Plasma processing method and plasma processing device." This invention involves a method where, during plasma ashing on a resist on a wafer, a deposit gas containing at least one type of deposit component generated from the resist is added to the plasma generation gas. This proactive approach allows the deposit component to form a protective layer on the inner surface of the wafer processing chamber. Consequently, it safeguards the chamber from plasma-induced damage while also reducing the generation of harmful particles.

Career Highlights: Onishi's professional journey includes his tenure at Matsushita Electric Industrial Co., Ltd., where he has been instrumental in developing cutting-edge technologies that enhance manufacturing processes. His focus on innovation not only showcases his technical prowess but also reflects his commitment to advancing the semiconductor industry.

Collaborations: Throughout his career, Katsuhiko Onishi has collaborated with renowned professionals, including his coworker Yoji Bito. This partnership has fostered an environment of shared knowledge and creativity, propelling advancements in their respective fields. Together, they have aimed to push the boundaries of technology and improve the efficiency of semiconductor manufacturing.

Conclusion: Katsuhiko Onishi's contributions to plasma processing technology exemplify the spirit of innovation and collaboration. His patent for a plasma processing method highlights a significant advancement in protecting wafer processing chambers, ultimately leading to more reliable and efficient semiconductor manufacturing processes. As technology continues to evolve, Onishi's work will undoubtedly remain influential in shaping the future of the industry.

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