Wallkill, NY, United States of America

Kathleen Mary Mc Guire


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2001

where 'Filed Patents' based on already Granted Patents

1 patent (USPTO):

Title: Innovative Contributions of Kathleen Mary Mc Guire in Thin Film Interconnect Technology

Introduction

Kathleen Mary Mc Guire is a prominent inventor based in Wallkill, NY, known for her innovative work in the field of thin film interconnect technology. With her extensive research and development, she has made significant contributions to enhancing the performance and stability of electronic components.

Latest Patents

Kathleen holds a notable patent titled "Structure and Process for Thin Film Interconnect." This invention pertains to a multilayer thin film interconnect structure designed to achieve improved dimensional stability and electrical performance. The essence of her innovation lies in a structure termed a compensator, which serves both as a ground/reference plane and a stabilizing entity for dimensional integrity. The compensator is constructed primarily from a metal sheet featuring a metallized via pattern, along with high-temperature stable polymer serving as an insulator.

Career Highlights

Kathleen Mary Mc Guire is affiliated with IBM, a leading company in technology and innovation. Throughout her career at IBM, she has focused on the development of advanced materials and structures that significantly influence the performance of electronic devices.

Collaborations

In her endeavors, Kathleen has collaborated with fellow engineers and researchers, including Krishna Gandhi Sachdev and Benedikt Maria Johannes Kellner. These collaborations have played a crucial role in refining her inventions and expanding the scope of her research.

Conclusion

Kathleen Mary Mc Guire's work exemplifies innovation in the electronics industry through her patented methods and structures for thin film interconnect technology. Her contributions not only enhance the functionality of devices but also pave the way for future advancements in the field.

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