Kirkwood, NY, United States of America

Kathleen L Covert

This inventor holds 6 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1991-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kathleen L Covert. Retrieved from https://idiyas.com/inventor/kathleen-l-covert

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 4

Forward Citations = 30(Granted Patents)


Location History:

  • Kirkwood, NY (US) (1991 - 1998)
  • late of Binghampton, NY (US) (2003)
  • late of Binghamton, NY (US) (2004)

Company Filing History:


Years Active: 1991-2004

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6 patents (USPTO):Explore Patents

Title: Innovations by Kathleen L Covert

Introduction

Kathleen L Covert is a notable inventor based in Kirkwood, NY (US). She has made significant contributions to the field of microelectronics, particularly through her innovative cleaning and etching compositions for copper surfaces. With a total of 6 patents, her work has advanced the fabrication processes used in microelectronic packages.

Latest Patents

One of her latest patents is titled "Copper cleaning compositions, processes and products derived therefrom." This invention presents a persulfate microetchant composition that effectively removes impurities from copper surfaces during the fabrication of microelectronic packages. The formulation is designed to selectively clean copper while preventing deleterious galvanic etching, which can lead to undercutting. This innovation simplifies the microelectronic fabrication process and enhances design features, particularly for higher density circuits. The preferred etchant composition includes 100 gm/liter sodium persulfate, 3 volume % phosphoric acid, and 0.058 molar sodium phosphate dibasic.

Another significant patent is "Copper etching compositions and products derived therefrom." This persulfate etchant composition is particularly useful for dissolving copper during microelectronic package fabrication. Similar to her cleaning composition, it selectively etches copper in the presence of nickel and noble metal alloys without causing undercutting. The etchant is also stabilized with acid and phosphate salts, ensuring a stable, fast-acting, and environmentally acceptable process that can be performed at room temperature. The preferred etchant composition for this invention is 230 gm/liter sodium persulfate, 3 volume % phosphoric acid, and 0.058 molar sodium phosphate dibasic.

Career Highlights

Kathleen L Covert is associated with the International Business Machines Corporation (IBM), where she has contributed her expertise in microelectronics. Her innovative work has not only advanced the technology but has also positioned her as a key figure in her field.

Collaborations

Throughout her career, Kathleen has collaborated with notable colleagues, including John M Lauffer and Peter A Moschak. These collaborations have further enriched her contributions to the field of microelectronics.

Conclusion

Kathleen L Covert's innovative patents and contributions to microelectronics demonstrate her significant impact on the industry. Her work continues to influence the design and fabrication of microelectronic packages, showcasing her

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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