Location History:
- Herrenberg-Gultstein, DE (1989)
- Guelstein, DE (1985 - 1990)
Company Filing History:
Years Active: 1985-1990
Title: **Innovative Contributions of Karl Asch in Lithography Technologies**
Introduction
Karl Asch, an accomplished inventor based in Guelstein, Germany, has made significant strides in the field of lithography through his innovative solutions and patents. With a total of three patents to his name, Asch's work primarily focuses on enhancing the efficiency and effectiveness of lithographic processes, particularly within the semiconductor industry.
Latest Patents
1. **Removal of Particles from Solid-State Surfaces by Laser Bombardment**
This patent outlines a method for cleaning small particles from the surfaces of solid bodies. By directing at least one high-power density laser pulse, specifically from an excimer laser, onto the surface, this innovative approach is particularly effective for cleaning silicon masks used in electron-beam lithographic devices. The invention includes an arrangement for in-situ cleaning of masks, integrated within the electron-beam lithographic device itself.
2. **Mask for Ion, Electron or X-Ray Lithography and Method of Making It**
In this patent, Asch describes a novel mask for radiation beam lithography. This mask is created from a semiconductor wafer, which is thinned to create a membrane with a defined hole pattern. Doping with a tensile stress-generating material ensures that the mask remains tension-free while under irradiation. The process involves complex steps such as etching and ion implantation, all finely tuned to achieve optimum performance in various lithographic applications.
Career Highlights
Karl Asch has spent a notable portion of his career at the International Business Machines Corporation (IBM), where he has contributed to advancements in lithographic technologies. His innovative patents stand testimony to his expertise and the valuable impact he has had in the industry.
Collaborations
Throughout his career, Asch has collaborated with fellow innovators such as Werner Zapka and Joachim H. Keyser. These partnerships have facilitated the exchange of ideas and expertise, enhancing the development of cutting-edge technologies in lithography.
Conclusion
Karl Asch's contributions to the field of lithography through his inventive methodologies and patented technologies have marked him as a noteworthy figure in the industry. His work continues to influence advancements in semiconductor processing, showcasing the importance of innovation and collaboration in scientific research.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.