Kap Ryol Park

Title: Innovations by Kap Ryol Park

Introduction

Kap Ryol Park is a notable inventor based in Taegu-kwangyokshi, South Korea. He has made significant contributions to the field of substrate receiving technology. With a total of two patents to his name, his work focuses on preventing substrate damage during loading and unloading processes.

Latest Patents

Kap Ryol Park's latest patents include a substrate receiving method and a substrate receiving apparatus. The substrate receiving apparatus is designed to prevent substrate damage when a substrate is loaded or unloaded from a cassette. This invention features a cassette with multiple plates to accommodate several substrates, a cassette loading unit for uploading and downloading the cassette, and a port that supports the loading unit. Additionally, it includes auxiliary plates that are inserted into the cassette from the outside. The method involves downloading a cassette to transfer substrates from the plates to the auxiliary plates, unloading and loading the substrates from the auxiliary plates to the cassette, and then uploading the cassette to move the substrates back to the plates.

Career Highlights

Throughout his career, Kap Ryol Park has worked with prominent companies in the technology sector. He has been associated with LG Display Co., Ltd. and LG Philips LCD Co., Ltd. His experience in these organizations has contributed to his expertise in substrate technology.

Collaborations

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Conclusion

Kap Ryol Park's innovations in substrate receiving technology demonstrate his commitment to enhancing the efficiency and safety of substrate handling processes. His patents reflect a deep understanding of the challenges in this field and offer practical solutions to prevent damage during operations.