Kangmin Jung

Title: Kangmin Jung: Innovator in Lithography Systems

Introduction

Kangmin Jung is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of lithography systems, particularly through his innovative methods in optical proximity correction and photomask fabrication. With a total of 2 patents, his work has garnered attention in the technology sector.

Latest Patents

Kangmin Jung's latest patents include an optical proximity correction method and a mask manufacturing method for lithography systems. The optical proximity correction method involves dividing a transmission cross coefficient (TCC) for each slit region, generating an optical proximity correction (OPC) model, and correcting the OPC model using fitted critical dimension (CD) data. The method of fabricating a photomask focuses on designing a layout of patterns on a wafer, correcting the layout to create a photoresist pattern, and performing optical proximity correction at both chip and shot levels.

Career Highlights

Kangmin Jung is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of innovation in lithography technology. His expertise in optical proximity correction has positioned him as a key player in the development of advanced manufacturing processes.

Collaborations

Kangmin has collaborated with notable colleagues such as Sangwook Park and Youngdeok Kwon, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Kangmin Jung's contributions to the field of lithography systems through his patents and work at Samsung Electronics Co., Ltd. highlight his role as a leading inventor in the industry. His innovative methods continue to influence advancements in technology.