Company Filing History:
Years Active: 2023
Title: Innovations of Kai-Hsiang Ke in 2D Material Analysis
Introduction
Kai-Hsiang Ke is a notable inventor based in Chiayi, Taiwan. He has made significant contributions to the field of material science, particularly in the analysis of 2D material thin films. His innovative approach has led to the development of a patented method that enhances the understanding and application of these materials.
Latest Patents
Kai-Hsiang Ke holds a patent for a "Method and system for analyzing 2D material thin film." This patent describes a comprehensive detection method that includes capturing sample images of 2D material thin films and measuring them using a Raman spectrometer. The process involves performing a visible light hyperspectral algorithm on the sample images to generate multiple visible light hyperspectral images. Furthermore, it includes a training and validation procedure to establish a thin film prediction model, which is crucial for analyzing the thin film images captured by an optical microscope.
Career Highlights
Kai-Hsiang Ke is affiliated with National Chung Cheng University, where he continues to advance research in material science. His work not only contributes to academic knowledge but also has practical implications in various industries that utilize 2D materials.
Collaborations
He collaborates with esteemed colleagues such as Hsiang-Chen Wang and Kai-Chun Li, enhancing the research output and innovation potential within their field.
Conclusion
Kai-Hsiang Ke's contributions to the analysis of 2D material thin films exemplify the importance of innovation in material science. His patented methods pave the way for future advancements in this critical area of research.