Padur, India

Kadirvel Chockalingam Vanniarajan


Average Co-Inventor Count = 5.5

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):

Title: Innovations by Kadirvel Chockalingam Vanniarajan

Introduction

Kadirvel Chockalingam Vanniarajan is an accomplished inventor based in Padur, India. He has made significant contributions to the field of technology, particularly in the areas of device enrollment and cloud-based privacy controls. With a total of two patents to his name, Vanniarajan's work reflects a commitment to enhancing security and privacy in digital communications.

Latest Patents

Vanniarajan's latest patents include "Techniques for enrolling a device or service using a proximity channel and a cloud channel." This innovation provides systems, devices, and methods for establishing trust between devices through a mutual authentication process. The process involves the exchange of grant codes, allowing for secure enrollment and identity certificate issuance. His second patent, "Techniques for cloud-based privacy controls," focuses on encrypting user content using a content encryption key (CEK). This method ensures that user data is protected through a double-encryption process, allowing for controlled access based on privacy policies.

Career Highlights

Kadirvel Chockalingam Vanniarajan is currently employed at Amazon Technologies, Inc., where he continues to develop innovative solutions that address contemporary challenges in technology. His work at Amazon has positioned him as a key player in the advancement of secure digital communications.

Collaborations

Vanniarajan has collaborated with notable colleagues such as Sachin Purushottam Joglekar and Temesghen Kahsai Azene. These collaborations have further enriched his contributions to the field and fostered a culture of innovation within his team.

Conclusion

Kadirvel Chockalingam Vanniarajan's contributions to technology through his patents demonstrate his expertise and dedication to improving security and privacy in digital environments. His work continues to influence the industry and pave the way for future innovations.

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