Spartanburg, SC, United States of America

K David Lake, Jr

USPTO Granted Patents = 5 

Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2003-2019

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5 patents (USPTO):Explore Patents

Title: K David Lake, Jr: Innovator in Additive Compositions

Introduction

K David Lake, Jr. is a notable inventor based in Spartanburg, SC (US). He has made significant contributions to the field of polymer additives, holding a total of 5 patents. His work focuses on developing innovative additive compositions that enhance the properties of polymers.

Latest Patents

Among his latest patents, one is titled "Additive composition and methods for using the same." This patent describes an additive composition that comprises a plurality of granules, which include a polymer additive selected from clarifying agents, nucleating agents, and mixtures thereof. The granules have a particle size ranging from about 0.5 mm to about 2.8 mm, with a particle hardness of less than 50 cN. Another significant patent is "Additive composition and process for using the same," which details a composition that includes a wax and a nucleating agent. This process outlines the steps for producing a nucleated polymer using the described additive composition.

Career Highlights

K David Lake, Jr. is currently employed at Milliken & Company, where he continues to innovate in the field of polymer science. His work has contributed to advancements in additive technologies that are essential for various applications in the industry.

Collaborations

Throughout his career, K David Lake, Jr. has collaborated with talented individuals such as Nathan A Mehl and Christopher Thomas Kochanowicz. These collaborations have fostered a creative environment that enhances the development of new technologies.

Conclusion

K David Lake, Jr. is a prominent inventor whose work in additive compositions has made a significant impact in the field of polymer science. His innovative patents and collaborations reflect his dedication to advancing technology in this area.

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