Jyh-Fa Lee

Title: Innovations of Jyh-Fa Lee in Three-Dimensional Measurement Technology.

Introduction

Jyh-Fa Lee is a notable inventor based in Longtan, Taiwan. He has made significant contributions to the field of measurement technology, particularly in the development of methods for three-dimensional profile measurement and reconstruction.

Latest Patents

Jyh-Fa Lee holds a patent for a measurement method of three-dimensional profiles and a reconstruction system utilizing subpixel localization with color gratings and picture-in-picture switching on a single display. This innovative method includes several steps: preparation, projection, image extraction, image fine-tuning, image processing, and reconstruction. The system features a projection apparatus that emits a grating towards the workpiece, forming a grating image with identical contrast values for easier identification. Additionally, a central processing unit fine-tunes and reconstructs the three-dimensional profiles using the grating image and a switchable picture-in-picture display.

Career Highlights

Jyh-Fa Lee is affiliated with the Chung-Shan Institute of Science and Technology, Armaments Bureau, Ministry of National Defense. His work at this institution has allowed him to focus on advancing measurement technologies that have practical applications in various fields.

Collaborations

Throughout his career, Jyh-Fa Lee has collaborated with esteemed colleagues, including Chern-Sheng Lin and Mau-Shiun Yeh. These collaborations have contributed to the development and refinement of his innovative