Moscow, Russia

Jury I Goroshkov


Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 1988

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1 patent (USPTO):Explore Patents

Title: **Jury I. Goroshkov: Innovator in Cold Welding Methods**

Introduction

Jury I. Goroshkov, a notable inventor based in Moscow, Russia, has made significant contributions to the field of material science through his innovative methods. With a focus on cold welding techniques, Goroshkov has developed a unique approach that enhances manufacturing processes by efficiently joining materials without the need for heat.

Latest Patents

Goroshkov holds a patent for his invention titled "Method of Cold Welding." This method involves the cold welding of axially symmetric workpieces by applying axial stress to at least one piece while also imparting a relative turn in a plane that is perpendicular to the direction of the axial stress. This innovative technique not only improves the quality of the welds but also offers a more energy-efficient manufacturing alternative.

Career Highlights

Jury I. Goroshkov works at the Latvian State Institute, where he further explores and develops his ideas in materials engineering. His dedication to research and development has solidified his reputation as a pioneer in cold welding techniques, a field that holds great potential for various industrial applications.

Collaborations

Throughout his career, Goroshkov has collaborated with other prominent figures in the industry, including Anatoly S. Pranch and Pavel Ivanovich Gursky. These professional relationships have allowed for the exchange of ideas and innovations, further advancing the field of cold welding and related technologies.

Conclusion

Jury I. Goroshkov stands out as a key figure in the realm of industrial innovation. His patented method of cold welding exemplifies his commitment to finding efficient solutions in material fabrication. With his ongoing research and collaboration with esteemed colleagues, Goroshkov continues to contribute to advancements in this critical area of technology.

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