Junyan Dai

Title: Innovations of Junyan Dai in EUV Lithography

Introduction

Junyan Dai is an accomplished inventor based in Ithaca, NY (US). He has made significant contributions to the field of lithography, particularly in the development of resist compositions for extreme ultra-violet (EUV) lithography processes. His innovative work has implications for improving the efficiency and effectiveness of lithographic techniques.

Latest Patents

Junyan Dai holds a patent for "Organoelement resists for EUV lithography and methods of making the same." This patent focuses on resist compositions that contain silicon, boron, or both. These compositions are designed to enhance the reactive ion etch resistance of resist materials, improve their transmission, and facilitate substrate doping. This advancement is crucial for the ongoing evolution of lithography technologies.

Career Highlights

Throughout his career, Junyan Dai has been associated with notable institutions such as the Cornell Research Foundation Inc. and the University of Wisconsin-Madison. His work in these organizations has allowed him to explore and develop innovative solutions in the field of lithography.

Collaborations

Junyan Dai has collaborated with esteemed colleagues, including Christopher Kemper Ober and Lin Wang. These partnerships have contributed to the advancement of research and development in lithographic technologies.

Conclusion

Junyan Dai's contributions to EUV lithography through his innovative patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in lithographic processes and materials.