Junko Ono

Title: Junko Ono - Innovator in Dielectric Film Manufacturing

Introduction

Junko Ono is a prominent inventor based in Fuchu, Japan. She has made significant contributions to the field of dielectric film manufacturing, showcasing her expertise and innovative spirit. Her work focuses on developing methods that enhance the performance and efficiency of dielectric films.

Latest Patents

Junko Ono holds a patent for a dielectric film manufacturing method. This invention provides a manufacturing technique that reduces leak current values while maintaining relative permittivity. It also addresses the challenges of deposition rates caused by sputtering rate reductions and ensures excellent planar uniformity. The method involves forming a dielectric film of a metal oxide primarily composed of aluminum, silicon, and oxygen on a substrate. The process includes creating an amorphous metal oxide with a specific molar fraction of silicon to aluminum and subjecting it to annealing treatment at high temperatures to achieve a crystalline phase.

Career Highlights

Ono is associated with Canon Anelva Corporation, where she applies her knowledge and skills in the development of advanced manufacturing techniques. Her work has been instrumental in pushing the boundaries of dielectric film technology.

Collaborations

Some of her notable coworkers include Naomu Kitano and Takashi Nakagawa, who have collaborated with her on various projects within the company.

Conclusion

Junko Ono's innovative contributions to dielectric film manufacturing highlight her role as a leading inventor in her field. Her patented methods not only improve performance but also pave the way for future advancements in technology.