Jung Kim

Title: Innovations of Jung Kim in Plasma Processing Technology

Introduction

Jung Kim is an accomplished inventor based in Fremont, CA (US). He has made significant contributions to the field of plasma processing technology, particularly through his innovative patent related to film characterization in processing chambers. His work is instrumental in advancing the efficiency and accuracy of plasma processing techniques.

Latest Patents

Jung Kim holds a patent for an RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamber. This patent outlines a method for characterizing deposited film on a substrate during processing. The method involves determining the voltage-current characteristics for a probe head, applying an RF train to the probe head, and employing initial resistance and capacitance values to generate simulated voltage-time curves. The comparison of these curves allows for precise characterization of the deposited film, enhancing the understanding of film properties during plasma processing.

Career Highlights

Jung Kim is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His role involves developing advanced technologies that improve plasma processing capabilities. With a focus on innovation, he has successfully contributed to the company's mission of delivering cutting-edge solutions to its clients.

Collaborations

Jung Kim collaborates with notable colleagues such as Jean-Paul Booth and Luc Albarede. Their combined expertise fosters a creative environment that drives technological advancements in their field.

Conclusion

Jung Kim's contributions to plasma processing technology through his innovative patent demonstrate his commitment to advancing the industry. His work not only enhances the understanding of film characterization but also supports the ongoing evolution of semiconductor manufacturing processes.