Jung-Hyeon Lee

Title: Innovations of Jung-Hyeon Lee in Semiconductor Technology

Introduction

Jung-Hyeon Lee is a notable inventor based in Kyunggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of capacitance measurement. His work has implications for improving the reliability of exposure processes in semiconductor manufacturing.

Latest Patents

One of Jung-Hyeon Lee's key patents is titled "Capacitance compensation for topological measurements in a semiconductor device." This invention addresses the reduction in focusing error during the exposure process. It involves forming a conductive layer over a wafer, which is essential for accurate topology measurement by a capacitance gauge. The conductive layer is designed to be sufficiently thick, ensuring that variations in capacitance readings are not influenced by the underlying material and structure of the wafer. This innovation allows for precise measurement of the wafer's real topology, leading to more reliable exposure processing.

Career Highlights

Jung-Hyeon Lee is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work at Samsung has positioned him as a key player in advancing semiconductor technologies. With a total of 1 patent, he continues to contribute to the field through innovative solutions.

Collaborations

Jung-Hyeon Lee has collaborated with notable colleagues such as Jin-seog Hong and Ho-Young Kang. Their teamwork has fostered an environment of innovation and has led to advancements in semiconductor technology.

Conclusion

Jung-Hyeon Lee's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to enhancing manufacturing processes. His work continues to influence the industry positively.