Jung Hwa Park

Title: Innovations of Jung Hwa Park

Introduction

Jung Hwa Park is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of display technology, holding a total of 3 patents. His work primarily focuses on enhancing the functionality and efficiency of display devices.

Latest Patents

One of Jung Hwa Park's latest patents is a display device that includes an auxiliary layer. This innovative display device features a substrate with a second semiconductor layer made of silicon. The design includes a second gate lower electrode that overlaps a channel region of the second semiconductor layer, along with a second gate insulating layer. Additionally, a second gate upper electrode and a light blocking layer are positioned on the second gate insulating layer. The first auxiliary layer is placed on the second gate upper electrode and the light blocking layer, while a first semiconductor layer, which includes an oxide semiconductor, overlaps the light blocking layer. The first gate electrode also overlaps a channel region of the first semiconductor layer. The first auxiliary layer consists of an insulating layer that includes compounds such as SiNx, SiOx, and SiON, along with materials selected from fluorine, chlorine, and carbon.

Career Highlights

Jung Hwa Park is currently employed at Samsung Display Co., Ltd., where he continues to innovate in the field of display technologies. His work has been instrumental in advancing the capabilities of modern display devices.

Collaborations

Jung Hwa Park collaborates with talented individuals such as Jae-Bum Han and Young Gil Park, who contribute to the innovative projects at Samsung Display Co., Ltd.

Conclusion

Jung Hwa Park's contributions to display technology through his patents and collaborations highlight his role as a key inventor in the industry. His work continues to influence the development of advanced display devices.