Location History:
- Wappingers Falls, NY (US) (1995 - 1999)
- Yokohama, JP (1999 - 2002)
Company Filing History:
4 out of 52,789 
1 out of 833,002 Years Active: 1995-2002
Title: Jun-ichi Shiozawa: Innovator in Semiconductor Technology
Introduction
Jun-ichi Shiozawa is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.
Latest Patents
One of his latest patents is for a semiconductor device with a thin gate stack having a plurality of insulating layers. This invention aims to provide a semiconductor device capable of realizing a thin gate stack and the manufacturing method thereof. The structure includes a gate cap layer and/or a protection insulating film that has multiple insulating materials stacked on each other. This innovative design allows for the exposure of an insulating layer with a lower etching rate during the etching of the interlayer insulating layer, enabling the formation of a thinner gate stack and reducing the aspect ratio of the contact hole in the device. This invention is particularly suitable for a SAC used in DRAM applications.
Another notable patent involves a field effect transistor with elevated source and drain regions. In this invention, an isolating structure is formed on a semiconductor substrate to define an active area. A gate structure is insulated from the surface of the active area, and an amorphous silicon film is formed on the gate structure and the substrate. Portions of this film are converted into an epitaxial film and a polysilicon film, with impurities diffused throughout. The resulting structure allows for the formation of source and drain regions in the active area of the semiconductor substrate.
Career Highlights
Jun-ichi Shiozawa has worked with notable companies, including Kabushiki Kaisha Toshiba. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Throughout his career, Shiozawa has collaborated with talented individuals, including Yoshitaka Tsunashima and Katsuya Okumura. These collaborations have fostered advancements in semiconductor research and development.
Conclusion
Jun-ichi Shiozawa's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key figure in the field. His work continues to influence the development of advanced semiconductor devices.