Gyeonggi-do, South Korea

Jun-Hyoung Park


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: Innovations of Jun-Hyoung Park

Introduction

Jun-Hyoung Park is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of materials science, particularly in the development of release films and coating compositions. With a total of 2 patents, his work has garnered attention for its practical applications in various industries.

Latest Patents

One of Jun-Hyoung Park's latest patents is a method for measuring the peeling stability of release film and release film laminate. This innovative method involves measuring a high-speed release strength balance and a low-speed strength balance based on General Formulas 1 and 2. Another significant patent is for a silicone-based coating composition, which includes a silicone-based resin, a silicone-based hardener, and a thermal initiator. This composition also features a silicone-based compound of Chemical Formula 1. Additionally, it encompasses a silicone-based release film that consists of a base layer and a coating layer, which is a cured product of the silicone-based coating composition.

Career Highlights

Jun-Hyoung Park is currently employed at LG Chem, Ltd., a leading chemical company known for its innovative products and solutions. His work at LG Chem has allowed him to focus on advancing technologies related to silicone-based materials and their applications.

Collaborations

One of his notable collaborators is Jang-Soon Kim, who is a talented woman in the field. Their partnership has contributed to the successful development of innovative solutions in their area of expertise.

Conclusion

Jun-Hyoung Park's contributions to the field of materials science through his patents and work at LG Chem highlight his role as a significant inventor. His innovative approaches to release films and coating compositions continue to influence the industry positively.

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