This inventor holds 1 USPTO granted patent. Top assignee: Lam Research Corporation. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018
Title: Innovations of Jun Hee Han
Introduction
Jun Hee Han is an accomplished inventor based in Fremont, CA (US). He has made significant contributions to the field of plasma etching technology. His innovative work has led to the development of a unique system and method for ion milling in a plasma etch chamber.
Latest Patents
Jun Hee Han holds 1 patent for his invention titled "System, method and apparatus for ion milling in a plasma etch chamber." This patent describes a system that includes a plasma etch chamber, multiple process gas sources, a radio frequency bias source, and a controller. The design features a non-pivoting and non-rotating substrate support that allows for processing without mechanical clamps. The controller is equipped with logic stored on computer-readable media to perform the ion milling process effectively.
Career Highlights
Jun Hee Han is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work focuses on advancing technologies that enhance the efficiency and effectiveness of plasma etching processes.
Collaborations
Jun Hee Han has collaborated with notable colleagues, including Joydeep Guha and Butsurin Jinnai. These collaborations have contributed to the development of innovative solutions in the field.
Conclusion
Jun Hee Han's contributions to plasma etching technology exemplify the spirit of innovation in the semiconductor industry. His patent and work at Lam Research Corporation highlight his commitment to advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile