White Plains, NY, United States of America

Julia Anatolyevna Valuyeva


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2003

where 'Filed Patents' based on already Granted Patents

1 patent (USPTO):

Title: The Innovations of Julia Anatolyevna Valuyeva

Introduction

Julia Anatolyevna Valuyeva is an accomplished inventor based in White Plains, NY. He has made significant contributions to the field of geometric modeling through his innovative patent. His work focuses on simplifying complex geometric models to enhance rendering efficiency.

Latest Patents

Valuyeva holds a patent for a "System and method for the coordinated simplification of surface and wire-frame descriptions of a geometric model." This system is designed to simplify a geometric model, thereby accelerating the rendering process. The patent details how a surface description of the geometric model is stored in one or more system memories, along with a wire-frame description. The surface simplification process modifies the surface description to create an approximation of the original, while a wire-frame draping process drapes the wire-frame description onto the simplified surface. The resulting simplified line segments and surface description are then rendered onto a display device.

Career Highlights

Valuyeva is associated with International Business Machines Corporation (IBM), where he has been able to apply his innovative ideas in a collaborative environment. His work at IBM has allowed him to contribute to advancements in technology and geometric modeling.

Collaborations

Some of Valuyeva's notable coworkers include William Pettit Horn and James Thomas Klosowski. Their collaboration has likely fostered an environment of creativity and innovation, leading to significant advancements in their respective fields.

Conclusion

Julia Anatolyevna Valuyeva is a notable inventor whose work in geometric modeling has made a lasting impact. His patent demonstrates a commitment to innovation and efficiency in technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…