Company Filing History:
Years Active: 2012
Title: Juha Allan Kustaa-Adolf Poutiainen: Innovator in Atomic Layer Deposition Technology
Introduction
Juha Allan Kustaa-Adolf Poutiainen is a notable inventor based in Helsinki, Finland. He has made significant contributions to the field of material deposition technologies, particularly through his innovative patent related to Atomic Layer Deposition (ALD). His work is instrumental in advancing the capabilities of thin film deposition processes.
Latest Patents
Poutiainen holds a patent for "Apparatuses and methods for deposition of material on surfaces." This invention discloses an apparatus designed for depositing conformal thin films via sequential self-saturating chemical reactions on heated surfaces. The apparatus features a movable single or dual-lid system, which includes a substrate holder attached to a reaction chamber lid. Additionally, the invention encompasses various embodiments, such as an exhaust flow plug, a gas distribution insert, a local heater, or a minibatch system. The patent also outlines several methods suitable for ALD, showcasing Poutiainen's innovative approach to enhancing deposition techniques.
Career Highlights
Juha Poutiainen is associated with Picosun Oy, a company recognized for its expertise in ALD technology. His role at Picosun has allowed him to further develop and refine his inventions, contributing to the company's reputation as a leader in the field. His work has not only advanced the technology but has also positioned Picosun as a key player in the market for thin film deposition solutions.
Collaborations
Poutiainen has collaborated with Sven Lindfors, a fellow innovator in the field. Their partnership has likely fostered the exchange of ideas and expertise, further enhancing the development of advanced deposition technologies.
Conclusion
Juha Allan Kustaa-Adolf Poutiainen is a prominent figure in the realm of material deposition, with a focus on Atomic Layer Deposition technology. His innovative patent and contributions to Picosun Oy highlight his commitment to advancing the field. His work continues to influence the development of new technologies in thin film deposition.
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