Company Filing History:
Years Active: 2012-2018
Title: Innovations of Juha A Kustaa-Adolf Poutiainen
Introduction
Juha A Kustaa-Adolf Poutiainen is a notable inventor based in Helsinki, Finland. He has made significant contributions to the field of atomic layer deposition (ALD) technology. With a total of two patents to his name, Poutiainen continues to push the boundaries of innovation in his area of expertise.
Latest Patents
Poutiainen's latest patents focus on atomic layer deposition apparatus and loading methods. The invention relates to methods and apparatus in which a plurality of ALD reactors are arranged in a specific pattern. Each ALD reactor is designed to receive a batch of substrates for ALD processing, featuring a reaction chamber that is accessible from the top. A series of loading sequences is executed using a loading robot. Each sequence involves picking up a substrate holder that carries a batch of substrates from a storage area and moving it into the reaction chamber of the designated ALD reactor.
Career Highlights
Poutiainen is currently employed at Picosun Oy, a company recognized for its advancements in ALD technology. His work at Picosun Oy has allowed him to develop innovative solutions that enhance the efficiency and effectiveness of ALD processes.
Collaborations
Poutiainen collaborates with Sven Lindfors, a fellow professional in the field. Their partnership contributes to the ongoing development of cutting-edge technologies in atomic layer deposition.
Conclusion
Juha A Kustaa-Adolf Poutiainen is a prominent figure in the field of atomic layer deposition, with a focus on innovative apparatus and methods. His contributions through patents and collaboration continue to shape the future of ALD technology.