Company Filing History:
Years Active: 1990-1991
Title: Juergen Rasch: Innovator in E-beam Testing Technology
Introduction
Juergen Rasch is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of electronic testing, particularly through his innovative methods for opens and shorts testing of capacitively coupled networks. With a total of 2 patents, his work has advanced the capabilities of E-beam testing systems.
Latest Patents
Rasch's latest patents focus on a method for opens/shorts testing of capacitively coupled networks. One of his patents describes an E-beam testing system that utilizes an electron beam to test samples with conductive elements. This system charges the conductive elements on the sample and employs a stacked pair of parallel extraction grids to control the angular distribution of secondary electrons. The method includes applying an unfocused flood electron beam to a broad surface of the body while simultaneously using a focused probe electron beam to detect electrical connections and short circuits without physical contact.
Career Highlights
Juergen Rasch is associated with International Business Machines Corporation (IBM), where he has contributed to the development of advanced testing technologies. His work has been instrumental in enhancing the efficiency and accuracy of electronic testing methods.
Collaborations
Rasch has collaborated with notable colleagues such as Steven D. Golladay and Fritz J. Hohn, further enriching the innovative environment at IBM.
Conclusion
Juergen Rasch's contributions to E-beam testing technology exemplify the impact of innovation in the field of electronics. His patents and collaborative efforts continue to influence advancements in electronic testing methodologies.