Location History:
- Boston, MA (US) (1999)
- Fremont, CA (US) (2004)
Company Filing History:
1 out of 8,373 
1 out of 164,197 
Years Active: 1999-2004
Title: Juan Ferrera: Innovator in Electron Beam Lithography and Optical Switching
Introduction
Juan Ferrera is a notable inventor based in Fremont, CA, with a focus on advancements in electron beam lithography and optical switching technologies. He holds 2 patents that showcase his innovative contributions to the field.
Latest Patents
One of Ferrera's latest patents is titled "Spatial phase locking with shaped electron beam lithography." This invention enables fine positioning of a shaped or patterned charged particle beam without the need for intrusive fiducial marks. By utilizing a dithered shadow pattern, preferably in a grid form, the system can achieve precise corrections to the beam position in real time. This technology is particularly beneficial for mask making, as it avoids interference with the uniformity of beam illumination on the target.
Another significant patent is the "Wavelength-selective optical add/drop switch." This optical switch is designed to accept multiple copropagating optical channels, each with a distinct wavelength band. It features a wavelength-selective optical filter that extracts a selected channel while allowing others to continue propagating. The interferometric switch within the system can direct the selected channel to different output ports based on the control state, enhancing the flexibility and efficiency of optical communications.
Career Highlights
Throughout his career, Juan Ferrera has worked with prestigious organizations, including the Massachusetts Institute of Technology and IBM. His experience in these institutions has contributed to his expertise and innovative capabilities in the field of technology.
Collaborations
Some of his notable coworkers include Henry Ignatius Smith and Jay N Damask, who have collaborated with him on various projects, further enriching his professional journey.
Conclusion
Juan Ferrera's contributions to electron beam lithography and optical switching demonstrate his significant impact on technological advancements. His innovative patents reflect a commitment to enhancing precision and efficiency in these fields.