Company Filing History:
Years Active: 2017-2020
Title: Ju Ho Kim: Innovator in Semiconductor Technology
Introduction
Ju Ho Kim is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on developing cost-effective methods for manufacturing semiconductor devices, which are crucial for the advancement of electronic technologies.
Latest Patents
One of Ju Ho Kim's latest patents is a low-cost semiconductor device manufacturing method. This innovative method involves forming multiple body regions in a semiconductor substrate and creating multiple gate insulating layers and gate electrodes within these regions. The process includes implementing a blanket ion implantation across the entire surface of the substrate to establish a low concentration doping region, known as the LDD region, without the need for a mask. Additionally, a spacer is formed at the side wall of the gate electrode, followed by a high concentration ion implantation to create high concentration source and drain regions around the LDD region. This method not only enhances the electrical characteristics of the devices but also reduces manufacturing costs. By applying tilt and rotation co-implants during the formation of the high concentration regions, the LDD masking step can potentially be omitted, streamlining the manufacturing process.
Career Highlights
Ju Ho Kim is currently employed at Magnachip Semiconductor, Inc., where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the efficiency and cost-effectiveness of semiconductor manufacturing processes.
Collaborations
Ju Ho Kim has collaborated with notable colleagues, including Francois Hebert and Yon Sup Pang. Their combined expertise contributes to the development of cutting-edge semiconductor technologies.
Conclusion
Ju Ho Kim's contributions to semiconductor technology exemplify the importance of innovation in the electronics industry. His patents reflect a commitment to improving manufacturing processes while reducing costs, which is vital for the future of technology.